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MICRON SEMICONDUCTOR ASIA OPERATIONS PTE. LTD.

Principal/Staff Engineer, PCVD Film Deposition, TD

Junior Executive Full Time 5 年以上经验

月薪

$8,500 – $13,800

发布时间

2026年4月15日

截止 2026年4月29日

技能

Computer-aided design (CAD)PhysicsThin Film CoatingPECVDCharacterizationSemiconductorsElectrical EngineeringElectronicsMechanical EngineeringPVD

职位描述

Job Summary 

We are seeking a highly motivated engineer to join our Technology Development team focused on advanced thin film deposition processes for next-generation memory technologies. This role spans responsibilities from process development to technical leadership, depending on experience level (Principal/Staff). 

Key Responsibilities 

  • Develop and optimize advanced thin film deposition processes (ALD, LPCVD, PECVD, PVD) for cutting-edge device architectures

  • Design and execute complex DOE experiments to improve process capability, uniformity, and reliability

  • Perform in-depth root-cause analysis using advanced modeling and characterization techniques

  • Collaborate with integration, other process areas, metrology, and equipment engineering teams to solve critical technical challenges

  • Drive innovation in film deposition for improved performance, cost efficiency, and sustainability

  • Utilize advanced data analytics and modeling to predict process behavior and accelerate development cycles

  • Define technology roadmaps and lead strategic research initiatives. Generate intellectual property and influence future deposition technology directions

  • Mentor junior engineers and lead multi-disciplinary technical projects

Requirements:

Education: 

  • Ph.D / Master’s in Chemical Engineering, Materials Science, Electrical Engineering, Physics, or related field

Experience: 

  • Master with minimum 8 years or PhD with minimum 5 years hands-on experience in advanced thin film deposition, characterization or related semiconductor field 

Skills: 

Core Technical:  

  • Expertise in ALD, LPCVD, PECVD, and PVD for advanced nodes

  • Strong understanding of film growth mechanisms, surface chemistry, and plasma physics

  • Knowledge of thermodynamics, chemical kinetics, and reaction engineering

Analytical & Modeling:  

  • Proficiency in DOE, SPC, and advanced statistical analysis

  • Some Familiarity with TCAD or process simulation tools for film modeling 

  • Data analytics and machine learning for process optimization 

Characterization:  

  • Hands-on experience with TEM, SEM, XPS, SIMS, XRD, AFM, ellipsometry, and other thin film metrology

Problem-Solving:  

  • Advanced root-cause analysis and failure mode identification

  • Ability to develop predictive models for process behavior